激光直写无掩模光刻机Laser direct writing maskless lithography machine

型 号

英国 Microwriter ML3

Modle:ML3

技术指标


Specification:

激光光源:385nm,功率≤1W;

直写分辨率与加工速度:25mm2/min @0.6μm,50mm2/min @1μm,100mm2/min @2 μm,180mm2/min @5μm;

样品尺寸:≤230*230*15mm;

加工区域:≤150*150*10mm;

套刻精度:0.5 μm;

灰度直写阶数:255级,3D图案直写功能

Laser: 385nm, power≤1W;

Direct writing resolution and processing speed: 25mm2/min @0.6 μ m, 50mm2/min @1 μ m, 100mm2/min @2 μ m, 180mm2/min @5 μ m;

Sample size: < 230 * 230 * 15mm;

Processing area: < 150 * 150 * 10 mm;

Precision of engraving: 0.5 μ m;

Gray direct writing order: 255, 3D pattern direct writing function

主要功能:


Function:

激光束直接实现对光刻胶的曝光成型,不需要掩膜板。更灵活方式实现微纳结构或器件的加工及成型

The lithography of photoresist can be realized directly by laser beam without mask. A simpler way to realize the processing and shaping of micro / nano structures or devices

购置时间:

2018年

Purchase:2018

放置地点

清华大学逸夫技术科学楼B431室

Location:B431

联系电话:

62772554

Tel:62772554